200-300 mm

At the forefront of precision engineering, the Notion process equipment is designed to deliver exceptional performance in the application of resists using cutting-edge spin coating and spray coating technologies. Whether working with silicon wafers or glass substrates, the systems ensure uniform coverage, high throughput, and reliable results—meeting the demanding standards of semiconductor and photonics industries. The systems are optimized for wafer sizes ranging from 200 mm to 300 mm.

Photolithography processing systems used in industries such as semiconductors, medical and biomedical, micro OLED, microsystems (MEMS), glass and optical components, supporting wafer formats from 200 mm to 300 mm.