Comprehensive solutions for substrate processing up to 150 mm
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We produce compact, fully- and semi-automatic single wafer processing equipment for coating, developing, cleaning, etching, lift-off and cooling/heating of wafers, masks and other substrates. In every equipment, configured according to individual customer needs, various processes can run simultaneously. To do so – even for our individual engineering solutions – we use high-quality and functionally proven standard components for highest quality and repeatability.