Automatic Combined Cluster Systems

n-varixx-SERIES

  • Flexible configuration of processing modules
  • Handling thin, standard or bonded wafer (Si, glass & others)
  • Round wafer up to Ø300 mm (Ø12 inch)
  • Square substrates size up to 230 x 230 mm (9 x 9 inch)

Optional sub-systems; wafer flipper, PR dispense system (pumps, syringe, CPD) and media supply
cabinets with various canister designs.

Main features

SPIN COATER

Applications:

Spin coating with Covered Chuck Processor (CCP) or open bowl

SPRAY COATER

Applications:

Spray coating for all topographies and shapes

HOTPLATES

Applications:

Softbake (pre-bake), hardbake, HMDS: vapor priming, vacuum drying, coolplates

DEVELOPER

Applications:

Developing, cleaning, drying

BONDING/DEBONDING

Substrates:

Glass, Saphire, Silicon, Ceramic, other materials on request

INKJET PRINTING

High precision inkjet printing for any substrate type or wafer size

Further processing tools

n.unixx

Semi-automatic systems for lab applications

n.chemixx

Wet processing systems

 

n.maxx

Systems for large substrates